Homepage Forums Innovative Confinement Concepts (ICC) and others Z-pinch project leads to extreme ultraviolet lithography spinoff

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    AvatarIvy Matt

    The ZaP Flow Z-Pinch Experiment at the University of Washington, funded by the U.S. Department of Energy to study ways to improve plasma stability in a Z-pinch device, has spun off a business startup, called Zplasma, to develop a technology for manufacturing microprocessors using extreme ultraviolet light with a wavelength of 13.5 nanometers.


    I wish them luck. Many PF sources and pinch sources have competed for EUV lithography. The only one still standing (has funding) is a liquid tin Z-pinch system.

    ZaP Flow Z-pinch is nothing more than a PF with constant gas injection and a really long power pulse.

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